Enhancement of breakdown voltage for Ni-SiC Schottky diodes utilizing field plate edge termination

被引:9
作者
Ayalew, I [1 ]
Gehring, A [1 ]
Grasser, T [1 ]
Selberherr, S [1 ]
机构
[1] Vienna Univ Technol, Inst Microelect, Christian Doppler Lab TCAD Microelect, A-1040 Vienna, Austria
关键词
D O I
10.1016/j.microrel.2004.07.042
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work the improvement in breakdown voltage of Ni-SiC Schottky diodes utilizing field plate edge termination is presented. We have performed numerical investigations on how the addition of the field plate affects the relationship between the device structure, performance, and reliability. The key parameters that alter the overall device performance have been optimized using the device simulator MINIMOS-NT. This structure with a high barrier height metal such as Ni results in Schottky diodes with breakdown voltages in excess of 35% compared to the Schottky diodes without edge termination. The ratio of the maximum field under the anode corner to the field under the center of the contact at the same depth is reduced by a factor of two for edge terminated diodes for a wide range of doping levels. The leakage current in reverse biased operation is lowered by two orders of magnitude at room temperature and nearly by an order of magnitude at 500 K. (C) 2004 Elsevier Ltd. All rights reserved.
引用
收藏
页码:1473 / 1478
页数:6
相关论文
共 19 条
[1]   A SIMPLE EDGE TERMINATION FOR SILICON-CARBIDE DEVICES WITH NEARLY IDEAL BREAKDOWN VOLTAGE [J].
ALOK, D ;
BALIGA, BJ ;
MCLARTY, PK .
IEEE ELECTRON DEVICE LETTERS, 1994, 15 (10) :394-395
[2]  
[Anonymous], 2002, SEMICONDUCTOR DEVICE
[3]   Improving SiC lateral DMOSFET reliability under high field stress [J].
Ayalew, T ;
Gehring, A ;
Park, JM ;
Grasser, T ;
Selberherr, S .
MICROELECTRONICS RELIABILITY, 2003, 43 (9-11) :1889-1894
[4]  
AYALEW T, 2004, THESIS TU VIENNA
[5]   Effect of surface inhomogeneities on the electrical characteristics of SiC Schottky contacts [J].
Bhatnagar, M ;
Baliga, BJ ;
Kirk, HR ;
Rozgonyi, GA .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1996, 43 (01) :150-156
[6]  
Bozack MJ, 1997, PHYS STATUS SOLIDI B, V202, P549, DOI 10.1002/1521-3951(199707)202:1<549::AID-PSSB549>3.0.CO
[7]  
2-6
[8]   Reverse leakage current calculations for SiC Schottky contacts [J].
Crofton, J ;
Sriram, S .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1996, 43 (12) :2305-2307
[9]   Electrical behaviour and microstructural analysis of metal Schottky contacts on 4H-SiC [J].
Defives, D ;
Durand, O ;
Wyczisk, F ;
Noblanc, O ;
Brylinski, C ;
Meyer, F .
MICROELECTRONIC ENGINEERING, 2001, 55 (1-4) :369-374
[10]  
ITOH A, 1995, ISPSD '95 - PROCEEDINGS OF THE 7TH INTERNATIONAL SYMPOSIUM ON POWER SEMICONDUCTOR DEVICES & ICS, P101, DOI 10.1109/ISPSD.1995.515017