A new soft x-ray photoemission microscopy beamline at the National Synchrotron Light Source

被引:23
作者
Flege, J. I. [1 ]
Vescovo, E.
Nintzel, G.
Lewis, L. H.
Hulbert, S.
Sutter, P.
机构
[1] Brookhaven Natl Lab, Ctr Funct Nanomat, Upton, NY 11973 USA
[2] Brookhaven Natl Lab, Natl Synchrotron Light Source Dept, Upton, NY 11973 USA
关键词
low-energy electron microscopy; photoemission electron microscopy; Synchrotron radiation;
D O I
10.1016/j.nimb.2007.04.095
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
We report the present status of a newly installed low-energy electron microscopy and photoelectron microscopy end station at beamline U5UA at the National Synchrotron Light Source. In first test experiments on sub-monolayer Au coverages deposited on Ru(0001) we demonstrate core-level and valence band photoelectron imaging with a lateral resolution of about 65 nm at a field of view of 10 Pin. In contrast to other installations for photoelectron microscopy, the new NSLS end station uses illumination under normal incidence. The implications of this geometry for different applications are discussed. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:855 / 858
页数:4
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