A Ka-Band Low-Noise Amplifier for Space Applications in a 100 nm GaN on Si technology

被引:0
作者
Pace, Lorenzo [1 ]
Ciccognani, Walter [1 ]
Colangeli, Sergio [1 ]
Longhi, Patrick Ettore [1 ]
Limiti, Ernesto [1 ]
Leblanc, Remy [2 ]
机构
[1] Univ Roma Tor Vergata, Dept Elect Engn, Rome, Italy
[2] OMMIC SAS, 2 Rue Moulin, F-94453 Limeil Brevannes, France
来源
2019 15TH CONFERENCE ON PHD RESEARCH IN MICROELECTRONICS AND ELECTRONICS (PRIME) | 2019年
基金
欧盟地平线“2020”;
关键词
Low-Noise Amplifier (LNA); Gallium Nitride (GaN); GaN-on-Si; high linearity; HEMT; Ka-band; PERFORMANCE; HEMTS; POWER;
D O I
10.1109/prime.2019.8787800
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper a MMIC Low-Noise Amplifier operating in Ka-band is presented. The chosen technology is a 100 nm GaN HEMT on a High Resistivity Silicon substrate. A fully deterministic approach based on constant mismatch circles has been used for the preliminary synthesis of matching networks. The designed four-stages LNA presents a 33 dB gain, Input/Output matching better than 21 dB and a Noise Figure of no more than 2.3 dB in the whole operating band, showing the suitability of the chosen technology to low-noise, high gain and linearity applications.
引用
收藏
页码:161 / 164
页数:4
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