PVT and Aging Degradation Invariant Automated Optimization Approach for CMOS Low-Power High-Performance VLSI Circuits

被引:0
作者
Kalluru, Hema Sai [1 ]
Saha, Prasenjit [1 ]
Zahra, Andleeb [1 ]
Abbas, Zia [1 ]
机构
[1] Int Inst Informat Technol, Ctr VLSI & Embedded Syst Technol CVEST, Hyderabad IIIT H, Hyderabad, India
来源
PROCEEDINGS OF THE 2021 TWENTY SECOND INTERNATIONAL SYMPOSIUM ON QUALITY ELECTRONIC DESIGN (ISQED 2021) | 2021年
关键词
Leakage; Propagation delays; Aging degradation; Algorithm; Optimization; Process Variations; CMOS; VLSI; ALGORITHM; SCHEME; NBTI;
D O I
10.1109/ISQED51717.2021.9424366
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
In this paper, we aim at optimizing the leakage power and propagation delays using optimization algorithms like Glowworm Swarm Optimization and Neighbourhood Cultivation Genetic Algorithm, subjected to variations in Process, Voltage, Temperature and Aging degradation (PVTA) targeting low power or high performance applications. For high performance applications, we synthesize transistor sizes, at which the critical path delay in worst case PVT conditions with 3 years of NBTI aging degradation is optimized below the critical path delay (of initial sizing) at nominal conditions keeping power budget in bound. On the other hand, for low power applications, we obtain transistor sizing where leakage is reduced by more than 50%, keeping a bound on critical path delay. We have also proposed a step by step optimization method for optimizing complex cells. All the pre and post stress simulations are performed using HSPICE for 22nm Metal Gate High-K dielectric model parameters. The temperature range and the supply voltage ranges are -55 degrees C to 125 degrees C and 0.72V to 0.88V respectively. The process parameters are considered at +/- 3 sigma variation. The ingenuous working of the circuits for the obtained sizing is ensured by Monte Carlo analysis evaluating over entire range of process variations and operating conditions for the intended life time.
引用
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页码:1 / 6
页数:6
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