Nonvolatile SRAM (NV-SRAM) Using Functional MOSFET Merged with Resistive Switching Devices

被引:46
作者
Yamamoto, Shuu'ichirou [1 ,2 ]
Shuto, Yusuke [2 ,3 ]
Sugahara, Satoshi [2 ,3 ]
机构
[1] Tokyo Inst Technol, Dept Informat Proc, Yokohama, Kanagawa 2268502, Japan
[2] Japan Sci & Technol Agcy, CREST, Kawaguchi, Saitama 3320012, Japan
[3] Tokyo Inst Technol, Imaging Sci & Engn Lab, Yokohama, Kanagawa 2268503, Japan
来源
PROCEEDINGS OF THE IEEE 2009 CUSTOM INTEGRATED CIRCUITS CONFERENCE | 2009年
基金
日本科学技术振兴机构;
关键词
LOW-POWER;
D O I
10.1109/CICC.2009.5280761
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The paper presents functional MOSFET (F-MOSFET) architecture using nonpolar-type resistive switching devices (RSDs) for nonvolatile SRAM (NV-SRAM) application. The architecture can be achieved by connecting a RSD to the source terminal of an ordinary MOSFET. The current drive capability of the F-MOSFET can be modified by the resistance state of the connected RSD, which is a very useful function for recently emerging nonvolatile logic and reconfigurable logic applications. NV-SRAM can be easily configured with a standard SRAM cell and F-MOSFETs. Using our developed SPICE macromodel for nonpolar-type RSDs, the circuit operation of the proposed N-VSRAM cell was computationally simulated.
引用
收藏
页码:531 / +
页数:2
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