Treatment of electrostatic interactions at the Si(100)-SiO2 interface

被引:1
作者
Prosandeyev, SA
Boureau, G
Carniato, S
机构
[1] Rostov State Univ, Dept Phys, Rostov On Don 344090, Russia
[2] Univ Paris 06, Lab Chim Phys Mat & Rayonnement, F-75231 Paris 05, France
关键词
D O I
10.1016/S0927-0256(97)00140-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Silica in equilibrium with silicon is known to be partly crystalline. Because of crystallographic constraints, models proposed so far (cristobalite as well as tridymite) deal with polar surfaces of silica, which are expected to be highly unstable, In this paper, using both exact treatments of simplified models and Monte-Carlo simulations of the real system with effective potentials, we show how the system compromises to decrease the electrostatic energy. We also investigate the role of electrostatic interactions on the formation of oxygen vacancies at the Si-SiO2 interface. Using a tight binding approach, implications of these interactions on mid-gap surface states in silica are also discussed. Copyright (C) 1998 Elsevier Science B.V.
引用
收藏
页码:159 / 162
页数:4
相关论文
共 13 条
[1]   Simulation of oxygen vacancies at the Si-SiO2 interface [J].
Carniato, S ;
Boureau, G ;
Harding, J .
RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1995, 134 (1-4) :179-183
[2]   Modelling oxygen vacancies at the Si(100)-SiO2 interface [J].
Carniato, S ;
Boureau, G ;
Harding, JH .
PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS AND MECHANICAL PROPERTIES, 1997, 75 (05) :1435-1445
[3]  
CIRACI S, 1981, SOLID STATE COMMUN, V40, P10915
[4]   MICROSCOPIC STRUCTURE OF THE SIO2/SI INTERFACE [J].
HIMPSEL, FJ ;
MCFEELY, FR ;
TALEBIBRAHIMI, A ;
YARMOFF, JA ;
HOLLINGER, G .
PHYSICAL REVIEW B, 1988, 38 (09) :6084-6096
[5]  
NOGUERA C, 1996, PHYSICS CHEM OXIDE S
[6]   SI-]SIO2 TRANSFORMATION - INTERFACIAL STRUCTURE AND MECHANISM [J].
OURMAZD, A ;
TAYLOR, DW ;
RENTSCHLER, JA ;
BEVK, J .
PHYSICAL REVIEW LETTERS, 1987, 59 (02) :213-216
[7]  
PAULING L, 1980, AM MINERAL, V65, P321
[8]   MOS INTERFACE STATES - OVERVIEW AND PHYSICOCHEMICAL PERSPECTIVE [J].
POINDEXTER, EH .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1989, 4 (12) :961-969
[9]   ELECTRONIC-STRUCTURE OF THE SURFACES OF LAYERED COPPER OXIDES [J].
PROSANDEYEV, SA ;
TENNENBOUM, IM .
PHYSICAL REVIEW B, 1995, 52 (06) :4545-4552
[10]  
PROSANDEYEV SA, IN PRESS