Size effect in cluster collision on solid surfaces

被引:23
作者
Matsuo, Jiro [1 ]
Ninomiya, Satoshi [1 ]
Nakata, Yoshihiko [1 ]
Ichiki, Kazuya [1 ]
Aoki, Takaaki [1 ]
Seki, Toshio [1 ]
机构
[1] Kyoto Univ, Quantum Sci & Engn Ctr, Uji, Kyoto 6110011, Japan
关键词
cluster; ion; SIMS; emission;
D O I
10.1016/j.nimb.2007.01.164
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
New surface modification processes have been demonstrated using gas cluster ion irradiations. Multiple collision and high energy density collision of cluster ions are responsible for "non-linear phenomena", which play an important role in the surface modification process. Because of the unique interaction between cluster ions and surface atoms, atomistic mechanisms of cluster ion bombardment must be understood for the further developments of this technology. Cluster size is a unique parameter for cluster ions. One of the fundamental questions in this surface modification technique is the cluster size effect. It is important to use appropriate cluster size in each process. Size dependence of sputtering yields and secondary ion yields with large Ar cluster (N > 300) have been measured. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:627 / 631
页数:5
相关论文
共 32 条
[11]   A new secondary ion mass spectrometry (SIMS) system with high-intensity cluster ion source [J].
Matsuo, J ;
Okubo, C ;
Seki, T ;
Aoki, T ;
Toyoda, N ;
Yamada, I .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2004, 219 :463-467
[12]   Sputtering of elemental metals by Ar cluster ions [J].
Matsuo, J ;
Toyoda, N ;
Akizuki, M ;
Yamada, I .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1997, 121 (1-4) :459-463
[13]  
NINOMIYA S, NUCL INSTR METH B
[14]   Indium oxide film formation by O2 cluster ion-assisted deposition [J].
Qin, W ;
Howson, RP ;
Akizuki, M ;
Matsuo, J ;
Takaoka, G ;
Yamada, I .
MATERIALS CHEMISTRY AND PHYSICS, 1998, 54 (1-3) :258-261
[15]   Cluster size dependence of sputtering yield by cluster ion beam irradiation [J].
Seki, T ;
Murase, T ;
Matsuo, J .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2006, 242 (1-2) :179-181
[16]  
Seki T., 2003, NUCL INSTRUM METH B, V59, P21
[17]  
Staudt C, 2002, PHYS REV B, V66, DOI 10.1103/PhysRevB.66.075419
[18]   Formation of large clusters during sputtering of silver [J].
Staudt, C ;
Heinrich, R ;
Wucher, A .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2000, 164 :677-686
[19]  
STILLINGER FH, 1985, PHYS REV B, V31, P5632
[20]   Thermal desorption of Si clusters from Si and Si-deposited Ta surfaces [J].
Tanaka, H ;
Kanayama, T .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (05) :1613-1617