Multilayers of amorphous carbon prepared by cathodic arc deposition

被引:63
作者
Anders, S
Callahan, DL
Pharr, GM
Tsui, TY
Bhatia, CS
机构
[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA
[2] Rice Univ, Dept Mat Sci, Houston, TX 77005 USA
[3] Adv Micro Devices Inc, Sunnyvale, CA 94088 USA
[4] IBM Corp, SSD, San Jose, CA 95193 USA
关键词
amorphous carbon film; cathodic arc deposition; Monte Carlo simulation;
D O I
10.1016/S0257-8972(97)00346-0
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Filtered cathodic are deposition is an effective technique for preparing amorphous hard carbon films of high quality. Pulsed biasing of the substrate leads to a variation of the ion energy. Therefore the film properties, which are influenced by the ion energy, can be changed over a wide range. Using an alternating high- and low-bias voltage, we have formed multilayers of hard and soft amorphous carbon films. The structure and mechanical properties of the multilayers were investigated by transmission electron microscopy and nanoindentation. They are discussed in relation to Monte Carlo computer simulations of the deposition process. It was found that the multilayer structure formation can be well predicted by the Monte Carlo computer code. (C) 1997 Elsevier Science S.A.
引用
收藏
页码:189 / 194
页数:6
相关论文
共 20 条
[1]  
AGER JW, 1995, APPL PHYS LETT, V66, P3445
[2]   TRANSPORT OF VACUUM-ARC PLASMAS THROUGH MAGNETIC MACROPARTICLE FILTERS [J].
ANDERS, A ;
ANDERS, S ;
BROWN, IG .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1995, 4 (01) :1-12
[3]  
ANDERS A, 1993, MATER RES SOC SYMP P, V314, P205, DOI 10.1557/PROC-314-205
[4]   EFFECT OF VACUUM ARE DEPOSITION PARAMETERS ON THE PROPERTIES OF AMORPHOUS-CARBON THIN-FILMS [J].
ANDERS, S ;
ANDERS, A ;
BROWN, IG ;
WEI, B ;
KOMVOPOULOS, K ;
AGER, JW ;
YU, KM .
SURFACE & COATINGS TECHNOLOGY, 1994, 68 :388-393
[5]  
Anders S, 1995, MATER RES SOC SYMP P, V383, P453, DOI 10.1557/PROC-383-453
[6]   MACROPARTICLE-FREE THIN-FILMS PRODUCED BY AN EFFICIENT VACUUM-ARC DEPOSITION TECHNIQUE [J].
ANDERS, S ;
ANDERS, A ;
BROWN, I .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (06) :4239-4241
[7]   T-DYN MONTE-CARLO SIMULATIONS APPLIED TO ION ASSISTED THIN-FILM PROCESSES [J].
BIERSACK, JP ;
BERG, S ;
NENDER, C .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1991, 59 :21-27
[8]   PLASMA SYNTHESIS OF METALLIC AND COMPOSITE THIN-FILMS WITH ATOMICALLY MIXED SUBSTRATE BONDING [J].
BROWN, IG ;
ANDERS, A ;
ANDERS, S ;
DICKINSON, MR ;
IVANOV, IC ;
MACGILL, RA ;
YAO, XY ;
YU, KM .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1993, 80-1 :1281-1287
[9]   VAPOR-DEPOSITION PROCESSES FOR AMORPHOUS-CARBON FILMS WITH SP3 FRACTIONS APPROACHING DIAMOND [J].
CUOMO, JJ ;
PAPPAS, DL ;
BRULEY, J ;
DOYLE, JP ;
SAENGER, KL .
JOURNAL OF APPLIED PHYSICS, 1991, 70 (03) :1706-1711
[10]  
DIETSCH R, 1995, COMMUNICATION