Interconnection Materials, Processes and Tools for Fine-pitch Panel Assembly of Ultra-thin Glass Substrates

被引:0
作者
Smet, Vanessa [1 ]
Huang, Ting-Chia [1 ]
Kawamoto, Satomi [2 ]
Singh, Bhupender [1 ]
Sundaram, Venky [1 ]
Raj, Pulugurtha Markondeya [1 ]
Tummala, Rao [1 ]
机构
[1] Georgia Inst Technol, Syst Packaging Res Ctr 3D, Atlanta, GA 30332 USA
[2] Namics Corp, Niigata, Japan
来源
2015 IEEE 65TH ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE (ECTC) | 2015年
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中图分类号
TP301 [理论、方法];
学科分类号
081202 ;
摘要
The needs for higher speed and bandwidth at low power for portable and high-performance applications has been driving recent innovations in packaging technologies with new substrate platforms with finer lithographic capability and dimensional stability, such as ultra-thin glass, to enable off chip interconnections pitch scaling, down to 30 m. Copper pillar flip-chip theunocompression bonding (TCB) has subsequently become a pervasive technology in the past decade, and is now considered as the next interconnection and assembly node for smart mobile and high-performance systems. However, additional innovations are needed to achieve high-throughput theunocompression bonding on fragile and thin glass, with short cycle times and process conditions within HVM (high-volume manufacturing) tool capability. These include material advances in surface finishes and pre-applied underfill materials with built-in flux, along with a unique co-development strategy to provide highspeed solutions with optimized TCB profiles that consider the dynamic theunal behavior of high-density glass substrates, underfill curing kinetics, as well as tool compatibility. These innovations are the key focus of this paper. Finite element heat transfer and thermomechanical modeling were carried out to emulate assembly processes and compare the behavior of glass substrates to that of current technologies. Residual stresses created during the cool-down phase were extracted to help define process windows for stress management in interconnections, by fine control of intermetallics (IMC) formation. Emerging surface finish chemistries compatible with high-density wiring with sub 10 m spacings, such as OSP or EPAG (electroless Pd, autocatalytic Au) finish, were also evaluated for their effect on the founed IMC systems. A new set of no-flow snap-cure underfill materials with high thermal stability, beyond existing conductive films or pastes, was developed in synergy with tools and processes for compatibility with advanced substrate technologies. Model predictions were validated with assembly trials on ultra-thin glass and organic substrates with 100 m thin cores. Design guidelines for bonding tools, materials and processes were finally derived, for high-speed thermocompression bonding, customized to the perfounance, reliability and cost needs of next-generation mobile and highperfoimance systems.
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页码:475 / 483
页数:9
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