Structure-Zone Modeling of Sputter-Deposited Thin Films: A Brief Review

被引：29

作者：

Kusano, Eiji ^{[1
]}

机构：

[1] Kanazawa Inst Technol, Ctr Adv Mat, Kanazawa, Ishikawa 9240838, Japan

来源：

APPLIED SCIENCE AND CONVERGENCE TECHNOLOGY | 2019年 / 28卷 / 06期

关键词：

Structure zone model; Sputtering; MICROSTRUCTURE; EVOLUTION; TITANIUM; STRESS; OXIDE;

D O I：

10.5757/ASCT.2019.28.6.179

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this paper, the structure zone model (SZM) for sputter-deposited thin films is reviewed through a systematic discussion of the dependence of film structure and properties on the discharge pressure and homologous substrate temperature. The SZM is applicable to the sputter-deposited metal and metal oxide thin films with a film thickness ranging from a few to several hundred nanometers. Furthermore, the SZM is evolved for the sputter-deposition of films through energization of the sputtered particles by replacing the axis of the deposition pressure with that of the effective energy per depositing atom. The results suggest that the SZM is valid as a conceptual diagram with respect to optimizing film-deposition conditions for industrial applications.

引用

页码：179 / 185

页数：7

共 25 条

[11] Revisitation of the structure zone model based on the investigation of the structure and properties of Ti, Zr, and Hf thin films deposited at 70-600 °C using DC magnetron sputtering [J].