Ridged LiNbO3 Waveguide Fabricated By a Novel Wet Etching/MeV Oxygen Ion Implantation Method

被引：9
|
作者：
Wang, Lei [1 ,3 ]
Zhao, Jin-Hua [1 ]
Fu, Gang [2 ]
机构：
[1] Shandong Univ, Sch Phys, Jinan 250100, Peoples R China
[2] Shandong Univ, Sch Sci, Jinan 250100, Peoples R China
[3] Shandong Univ, State Key Lab Crystal Mat, Jinan 250100, Peoples R China
来源：
JOURNAL OF LIGHTWAVE TECHNOLOGY | 2010年 / 28卷 / 09期
基金：
中国博士后科学基金; 中国国家自然科学基金;
关键词：
Ion implantation; lithium compounds; ridge waveguide; X-CUT LINBO3; LITHIUM-NIOBATE; INDEX;
D O I：
10.1109/JLT.2010.2045877
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We report on a new wet etching/ion implantation method for fabricating ridge waveguide on z-cut LiNbO3. The ridge structures are produced on LiNbO3 crystal by anisotropic wet etching via minus face. Mode guiding at wavelength of 632.8 nm has been realized by using direct 4.5 MeV oxygen implantation without any implantation mask. The ridge waveguide shows a reduced propagation loss of 1.3 dB/cm after the thermal annealing process.
引用
收藏
页码：1344 / 1348
页数：5
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