Fabrication of Fresnel zone plates for hard X-rays

被引：49
作者：
Jefimovs, K. [1 ]
Bunk, O.
Pfeiffer, F.
Grolimund, D.
van der Veen, J. F.
David, C.
机构：
[1] Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland
[2] Paul Scherrer Inst, Swiss Light Source, CH-5232 Villigen, Switzerland
来源：
MICROELECTRONIC ENGINEERING | 2007年 / 84卷 / 5-8期
关键词：
Fresnel zone plate; X-ray microscopy; electron beam lithography; electroplating; hard X-rays; focusing;
D O I：
10.1016/j.mee.2007.01.112
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A method to fabricate gold structures with high aspect ratio is presented. Fresnel zone plates with an outermost zone width of 100 nm and structures of 1 mu m height are fabricated. Preliminary focusing results at an X-ray energy of 8 keV are presented and ways to improve the zone plate parameters are discussed. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码：1467 / 1470
页数：4
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