Formation of Highly Textured Zn0.2Ni0.8Mn2O4 Thin Films by RF Magnetron Sputtering

被引：7
|
作者：
Ji, Mengxiao [1 ]
Ren, Wei [2 ,3 ]
Li, Lu [2 ]
Wang, Yonggang [4 ]
Zhang, Xiaobo [1 ]
Zhou, Qing [1 ]
Hu, Jian [1 ]
Jiang, Chunqi [3 ]
机构：
[1] Yunnan Univ, Sch Phys & Astron, Kunming 650091, Yunnan, Peoples R China
[2] Xian Univ Posts & Telecommun, Sch Sci, Xian 710121, Shaanxi, Peoples R China
[3] Old Dominion Univ, Dept Elect Engn, Norfolk, VA 23529 USA
[4] Shaanxi Normal Univ, Sch Phys & Informat Technol, Xian 710119, Shaanxi, Peoples R China
来源：
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY | 2018年 / 7卷 / 08期
基金：
中国国家自然科学基金;
关键词：
X-RAY-DIFFRACTION; ELECTRICAL-PROPERTIES; SPINEL FILMS; CATIONIC DISTRIBUTION; NEUTRON-DIFFRACTION; OPTICAL-PROPERTIES; NTC CERAMICS; ZN; MICROSTRUCTURE; TEMPERATURE;
D O I：
10.1149/2.0011809jss
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Highly textured Zn0.2Ni0.8Mn2O4 (ZNM) thin films were prepared on Si(100) substrates through RF magnetron sputtering under different annealing temperatures. The effects of annealing temperature on the microstructure and electrical properties of ZNM thin films were investigated. The mechanism of highly textured ZNM spinel film formation was discussed. (C) 2018 The Electrochemical Society.
引用
收藏
页码：N114 / N116
页数：3
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