Formation of Highly Textured Zn0.2Ni0.8Mn2O4 Thin Films by RF Magnetron Sputtering

被引：7

作者：

Ji, Mengxiao ^{[1
]}

Ren, Wei ^{[2
,3
]}

Li, Lu ^{[2
]}

Wang, Yonggang ^{[4
]}

Zhang, Xiaobo ^{[1
]}

Zhou, Qing ^{[1
]}

Hu, Jian ^{[1
]}

Jiang, Chunqi ^{[3
]}

机构：

[1] Yunnan Univ, Sch Phys & Astron, Kunming 650091, Yunnan, Peoples R China

[2] Xian Univ Posts & Telecommun, Sch Sci, Xian 710121, Shaanxi, Peoples R China

[3] Old Dominion Univ, Dept Elect Engn, Norfolk, VA 23529 USA

[4] Shaanxi Normal Univ, Sch Phys & Informat Technol, Xian 710119, Shaanxi, Peoples R China

来源：

ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY | 2018年 / 7卷 / 08期

基金：

中国国家自然科学基金;

关键词：

X-RAY-DIFFRACTION; ELECTRICAL-PROPERTIES; SPINEL FILMS; CATIONIC DISTRIBUTION; NEUTRON-DIFFRACTION; OPTICAL-PROPERTIES; NTC CERAMICS; ZN; MICROSTRUCTURE; TEMPERATURE;

D O I：

10.1149/2.0011809jss

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Highly textured Zn0.2Ni0.8Mn2O4 (ZNM) thin films were prepared on Si(100) substrates through RF magnetron sputtering under different annealing temperatures. The effects of annealing temperature on the microstructure and electrical properties of ZNM thin films were investigated. The mechanism of highly textured ZNM spinel film formation was discussed. (C) 2018 The Electrochemical Society.

引用

页码：N114 / N116

页数：3

共 50 条

[21] A study on structural formation and optical properties of Zn1-xCdxO thin films synthesized by the DC and RF reactive magnetron co-sputtering
Sui, Y. R.
Wu, Y. J.
Song, Y. P.
Lv, S. Q.
Yao, B.
Meng, X. W.
Xiao, L.
JOURNAL OF ALLOYS AND COMPOUNDS, 2016, 678 : 383 - 388
[22] Effect of Ar/(Ar+O2) ratio on the microstructures and dielectric properties of Zn2SnO4 thin films by RF magnetron sputtering
Chen, Yih-Chien
Shen, Yan-Ru
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2016, 27 (10) : 10562 - 10565
[23] Cu/TiO2 thin films prepared by reactive RF magnetron sputtering
Sreedhar, M.
Reddy, I. Neelakanta
Bera, Parthasarathi
Ramachandran, D.
Saravanan, K. Gobi
Rabel, Arul Maximus
Anandan, C.
Kuppusami, P.
Brijitta, J.
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2015, 120 (02): : 765 - 773
[24] Deposition of highly textured AlN thin films by reactive high power impulse magnetron sputtering
Moreira, Milena A.
Torndahl, Tobias
Katardjiev, Ilia
Kubart, Tomas
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2015, 33 (02):
[25] High textured AlN thin films grown by RF magnetron sputtering; composition, structure, morphology and hardness
Oliveira, IC
Grigorov, KG
Maciel, HS
Massi, M
Otani, C
VACUUM, 2004, 75 (04) : 331 - 338
[26] Characterization of Cu0.9In0.9Zn0.2Se2 Thin Films Prepared by One-step RF Magnetron Sputtering Process
Wang, Weijun
He, Jun
Zhang, Kezhi
Sun, Lin
Yang, Pingxiong
Chu, Junhao
PROCEEDINGS OF THE 2013 INTERNATIONAL CONFERENCE ON MATERIAL SCIENCE AND ENVIRONMENTAL ENGINEERING (MSEE 2013), 2013, : 414 - 418
[27] On the nucleation and growth of Zn1-xMnxO thin films grown by RF magnetron sputtering
Gopalakrishnan, N.
Elanchezhiyan, J.
Bhuvana, K. P.
Balasubramanian, T.
SCRIPTA MATERIALIA, 2008, 58 (10) : 930 - 933
[28] Microstructures and dielectric properties of inverse-spinel structure Zn2SnO4 thin films by RF magnetron sputtering
Chen, Yih-Chien
You, Hong-Mine
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2016, 27 (02) : 2031 - 2035
[29] Effect of RF power and sputtering pressure on the structural and optical properties of TiO2 thin films prepared by RF magnetron sputtering
Nair, Prabitha B.
Justinvictor, V. B.
Daniel, Georgi P.
Joy, K.
Ramakrishnan, V.
Thomas, P. V.
APPLIED SURFACE SCIENCE, 2011, 257 (24) : 10869 - 10875
[30] Microstructure and cation distribution of Mn2-xAlxZn0.2Ni0.6Mg0.2O4 high entropy oxide films
Ren, Wei
Ding, Tian
Wang, Wei-Li
Zhang, Yu-Xin
Li, Yi
Lu, Yi-Tian
Ma, Chao
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2023, 34 (07)

← 1 2 3 4 5 →