A dislocation-based dynamic strength model for tantalum across a large range of strain rates

被引:11
作者
Kositski, Roman [1 ]
Mordehai, Dan [1 ]
机构
[1] Technion Israel Inst Technol, Dept Mech Engn, IL-3200003 Haifa, Israel
关键词
CONSTITUTIVE MODEL; PLASTIC-DEFORMATION; MOLECULAR-DYNAMICS; RAMP COMPRESSION; SINGLE-CRYSTAL; METALS; SHOCK; TEMPERATURE; EVOLUTION; COPPER;
D O I
10.1063/5.0045131
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present a dislocation-based strength model for tantalum that captures the plastic deformation at high strain rates above 10(3) s(-1). The model has its origins in molecular dynamic simulations and it is implemented in a 3D continuum framework. We calibrate and validate the model using Split Hopkinson Pressure Bar, plate impact, and Richtmyer-Meshkov instability experiments. With the validated model, we can computationally generate stress-strain curves at strain rates of 10(3) - 10(7) s(-1) for samples with various initial dislocation densities. Based on the results, we show that the dynamic yield strength of annealed tantalum at high strain rates is followed by softening since mobile dislocation densities rapidly increase due to the high shear stress. This strain-softening is evident only at the high strain rate regime and it is much less pronounced in cold-worked Ta. Published under an exclusive license by AIP Publishing.
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页数:13
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