Demonstration of an ion-implanted, wavelength-shifted quantum-well laser

被引:19
作者
Poole, PJ [1 ]
Charbonneau, S [1 ]
Dion, M [1 ]
Aers, GC [1 ]
Buchanan, M [1 ]
Goldberg, RD [1 ]
Mitchell, IV [1 ]
机构
[1] UNIV WESTERN ONTARIO,DEPT PHYS,LONDON,ON N6A 3K7,CANADA
关键词
D O I
10.1109/68.475763
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A technique for fabricating many different wavelength lasers on the same wafer has been developed. High energy ion implantation was used to selectively blue shift the emission wavelength of an InP-based quantum well laser structure. This structure was then processed into fully functional broad-area lasers whose current threshold was unaffected by the implantation process, indicating extremely high material quality after bandgap-shifting. This process has the potential for the integration of not only different wavelength lasers, but also other devices, such as waveguides, detectors, modulators, etc., on a single wafer.
引用
收藏
页码:16 / 18
页数:3
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