Investigation of ion-implanted boron in diamond

被引:1
|
作者
Bharuth-Ram, K [1 ]
Ittermann, B
Metzner, H
Fullgrabe, M
Heemeier, M
Kroll, F
Mai, F
Marbach, K
Meier, P
Peters, D
Thiess, H
Ackermann, H
Sellschop, JPF
Stockmann, HJ
Lieb, KP
Uhrmacher, M
机构
[1] Univ Durban Westville, Dept Phys, ZA-4000 Durban, South Africa
[2] Univ Marburg, Fachbereich Phys, D-35032 Marburg, Germany
[3] Univ Gottingen, Inst Phys 2, D-37073 Gottingen, Germany
[4] Univ Witwatersrand, Johannesburg, South Africa
[5] Univ Gottingen, SFB 345, D-37073 Gottingen, Germany
关键词
boron; diamond; ion implantation; beta-NMR;
D O I
10.4028/www.scientific.net/MSF.258-263.763
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The fraction of boron atoms that take up defect-free sites on ion implantation in diamond has been investigated in beta-NMR measurements. Polarized B-12 nuclei were produced in the reaction B-11(d,p)B-12 with 1.5 MeV deuterons and recoil implanted into a diamond Ib sample. Depolarization resonance spectra were measured in an external magnetic field of 1.0 kG at sample temperatures ranging from 300 K to 800 K, showing that the polarised B-12 atoms retain their polarisation on implantation in diamond. The polarization asymmetry at the Larmor frequency yielded a fraction of boron atoms at defect-free tetrahedrally symmetric sites of 12(1)% at 300 K, increasing to 17(2)% at 800 K. The resonance spectra also showed evidence that some of the implanted boron atoms were at low symmetry sites. Measurements after pre-implantation of the diamond sample with 50 - 220 keV Li+ ions showed no significant change of the fraction of boron atoms that are implanted at defect-free symmetric sites in the diamond lattice.
引用
收藏
页码:763 / 768
页数:6
相关论文
共 50 条
  • [1] COMPARATIVE HALL MOBILITIES OF ION-IMPLANTED BORON AND IMPLANTED CARBON PLUS BORON IN INSULATING DIAMOND
    HEWETT, CA
    DELAHOUSSAYE, PR
    ROSER, M
    ZEIDLER, JR
    WILSON, RG
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1992, 139 (10) : 2977 - 2979
  • [2] Magnetic properties of ion-implanted diamond
    Hoehne, R.
    Esquinazi, P.
    Heera, V.
    Weishart, H.
    DIAMOND AND RELATED MATERIALS, 2007, 16 (08) : 1589 - 1596
  • [3] Defect engineering in ion-implanted diamond
    Gippius, AA
    Khmelnitski, RA
    Dravin, VA
    Tkachenko, SD
    DEFECT AND IMPURITY ENGINEERED SEMICONDUCTORS II, 1998, 510 : 431 - 436
  • [4] STRUCTURAL TRANSITIONS IN ION-IMPLANTED DIAMOND
    VAVILOV, VS
    KRASNOPEVTSEV, VV
    MILJUTIN, YV
    GORODETSKY, AE
    ZAKHAROV, AP
    RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1974, 22 (02): : 141 - 143
  • [5] Laser annealing of ion-implanted diamond
    Pimenov, SM
    Kononenko, VV
    Kononenko, TV
    Konov, VI
    Fischer, P
    Romano, V
    Weber, HP
    Khomich, AV
    Khmelnitskiy, RA
    ALT'02 INTERNATIONAL CONFERENCE ON ADVANCED LASER TECHNOLOGIES, 2003, 5147 : 128 - 139
  • [6] ANNEALING STUDIES ON ION-IMPLANTED DIAMOND
    SPITS, RA
    DERRY, TE
    PRINS, JF
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1992, 64 (1-4): : 210 - 214
  • [7] VOLUME EXPANSION OF ION-IMPLANTED DIAMOND
    MABY, EW
    MAGEE, CW
    MOREWOOD, JH
    APPLIED PHYSICS LETTERS, 1981, 39 (02) : 157 - 158
  • [8] Diffusion of ion-implanted boron in germanium
    Uppal, S
    Willoughby, AFW
    Bonar, JM
    Evans, AGR
    Cowern, NEB
    Morris, R
    Dowsett, MG
    JOURNAL OF APPLIED PHYSICS, 2001, 90 (08) : 4293 - 4295
  • [9] INVESTIGATION OF DEFECT FORMATION IN BORON ION-IMPLANTED SILICON DURING ANNEALING
    KOMAROV, FF
    KURYAZOV, VD
    SOLOVEV, VS
    SHIRYAEV, SY
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1981, 68 (02): : 519 - 529
  • [10] LATTICE ORIENTATION OF DEFECTS IN ION-IMPLANTED DIAMOND
    BRAUNSTEIN, G
    KALISH, R
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 209 (MAY): : 387 - 393