Evolution and defect analysis of vertical graphene nanosheets

被引:108
作者
Ghosh, Subrata [1 ]
Ganesan, K. [1 ]
Polaki, Shyamal R. [1 ]
Ravindran, T. R. [1 ]
Krishna, Nanda Gopala [2 ]
Kamruddin, M. [1 ]
Tyagi, A. K. [1 ]
机构
[1] Indira Gandhi Ctr Atom Res, Mat Sci Grp, Kalpakkam 603102, Tamil Nadu, India
[2] Indira Gandhi Ctr Atom Res, Corros Sci & Technol Grp, Kalpakkam 603102, Tamil Nadu, India
关键词
vertical graphene nanosheets; PECVD; Defect analysis; XPS; RAMAN-SPECTROSCOPY; GROWTH; CARBON; DISORDER;
D O I
10.1002/jrs.4530
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
We report catalyst-free direct synthesis of vertical graphene nanosheets (VGNs) on SiO2/Si and quartz substrates using microwave electron cyclotron resonance - plasma enhanced chemical vapor deposition. The evolution of VGNs is studied systematically at different growth stages. Raman analysis as a function of growth time reveals that two different disorder-induced competing mechanisms contributing to the defect band intensity. The VGNs grown on SiO2/Si substrates predominantly consists of both vacancy-like and hopping defects. On the other hand, the VGNs grown on quartz substrates contain mainly boundary-like defects. X-ray photoemission spectroscopy studies also corroborate Raman analysis in terms of defect density and vacancy-like defects for the VGNs grown on SiO2/Si substrates. Moreover, the grown VGNs exhibit a high optical transmittance from 95% to 78% at 550 nm and the sheet resistance varies from 30 to 2.17 k Omega/sq. depending on growth time. Copyright (C) 2014 John Wiley & Sons, Ltd.
引用
收藏
页码:642 / 649
页数:8
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