RHEED wave functions and the effect of reconstruction on secondary electron emission from the Si(100) surface

被引:6
作者
Kawamura, T. [1 ]
Maksym, P. A.
机构
[1] Yamanashi Univ, Dept Math & Phys, Kofu, Yamanashi 4008510, Japan
[2] Univ Leicester, Dept Phys & Astron, Leicester LE1 7RH, Leics, England
基金
英国工程与自然科学研究理事会;
关键词
electron-solid diffraction; RHEED; RHEED electron imensity; silicon; RHEED wave function;
D O I
10.1016/j.susc.2006.11.023
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The effect of surface reconstruction on contrast in scanning electron microscopy of the Si(100)-2 x 1 surface is investigated. A theory of the initial secondary production rate is developed and an upper bound on the rate is shown to depend on the product of the integrated intensities of the initial and final RHEED states. These states are calculated with a reflection matrix method and their depth dependence is investigated. The results are used to analyse scanning electron microscopy contrast in images of 1 x 2- and 2 x 1-regions of the Si(100)-2 x 1 surface reported by Watanabe et al. The calculated integrated intensities are consistent with the experimental images and with the experimentally observed dependence of the contrast on the azimuth of the incident electron beam. This supports the idea that the observed contrast is caused by the effect of surface reconstruction on the RHEED states. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:822 / 829
页数:8
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