Interface formation in W/Si multilayers studied by Low Energy Ion Scattering

被引：9
作者：
Zameshin, A. A. [1 ]
Medvedev, R., V [1 ]
Yakshin, A. E. [1 ]
Bijkerk, F. [1 ]
机构：
[1] Univ Twente, MESA Inst Nanotechnol, Ind Focus Grp XUV Opt, Enschede, Netherlands
来源：
THIN SOLID FILMS | 2021年 / 724卷
关键词：
Compendex;
D O I：
10.1016/j.tsf.2021.138569
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We studied the formation of interfaces in W/Si multilayer structures deposited by magnetron sputtering. In vacuo Low Energy Ion Scattering Spectroscopy was used to determine the materials growth profile with a close to atomic resolution. For that purpose, bi-layer structures, W-on-Si and Si-on-W were grown, with Si being deposited using Ar as the sputter gas and W being deposited in either Ar or Kr. The measurements revealed strongly asymmetric interfaces, with W-on-Si being significantly broader than Si-on-W. However, no difference was found in the W-on-Si interface width depending on the sputter gas, Ar or Kr, used for W deposition, suggesting that it is not a ballistic effect of the backscattered gas ions that is responsible for the wider W-on-Si interface. However, strong surface segregation of Si atoms upon the deposition of W in Kr on Si was observed. Mechanisms responsible for the observed effects are discussed.
引用
收藏
页数：8
相关论文
共 36 条
  • [11] THERMAL-STABILITY OF MULTILAYER FILMS PT/SI, W/SI, MO/SI, AND W/C
    JIANG, ZM
    JIANG, XM
    LIU, WH
    WU, ZQ
    [J]. JOURNAL OF APPLIED PHYSICS, 1989, 65 (01) : 196 - 200
  • [12] Ion-induced interface layer formation in W/Si and WRe/Si multilayers
    Kessels, MJH
    Verhoeven, J
    Tichelaar, FD
    Bijkerk, F
    [J]. SURFACE SCIENCE, 2005, 582 (1-3) : 227 - 234
  • [13] Kessels MJH, 2004, NUCL INSTRUM METH B, V222, P484, DOI 10.1016/j.nimb.2004.03.006
  • [14] Kittel C., 2018, Kittels Introduction to Solid State Physics
  • [15] Small d-spacing WSi2/Si narrow bandpass multilayers
    Liu, CA
    Conley, R
    Macrander, AT
    Graber, T
    Morawe, C
    Borel, C
    Dufresne, EM
    [J]. X-RAY SOURCES AND OPTICS, 2004, 5537 : 154 - 160
  • [16] Effect of Sputtering Deposition Process on Magnetic Properties of Magnetic Multilayers
    Maeda, Yukiharu
    Suzuki, Yusuke
    Sakashita, Yohei
    Iwata, Satoshi
    Kato, Takeshi
    Tsunashima, Shigeru
    Toyoda, Hirotaka
    Sugai, Hideo
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (10) : 7879 - 7885
  • [17] PARTICLE BOMBARDMENT EFFECTS ON THIN-FILM DEPOSITION - A REVIEW
    MATTOX, DM
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03): : 1105 - 1114
  • [18] Low-energy ion polishing of Si in W/Si soft X-ray multilayer structures
    Medvedev, R. V.
    Nikolaev, K. V.
    Zameshin, A. A.
    IJpes, D.
    Makhotkin, I. A.
    Yakunin, S. N.
    Yakshin, A. E.
    Bijkerk, F.
    [J]. JOURNAL OF APPLIED PHYSICS, 2019, 126 (04)
  • [19] THE SURFACE FREE-ENERGIES OF SOLID CHEMICAL-ELEMENTS - CALCULATION FROM INTERNAL FREE ENTHALPIES OF ATOMIZATION
    MEZEY, LZ
    GIBER, J
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1982, 21 (11): : 1569 - 1571
  • [20] RF magnetron sputtering of silver thin film in Ne, Ar and Kr discharges-plasma characterisation and surface morphology
    Novotny, Michal
    Bulir, Jiri
    Pokorny, Petr
    Lancok, Jan
    Fekete, Ladislav
    Musil, Jindrich
    Cekada, Miha
    [J]. SURFACE & COATINGS TECHNOLOGY, 2013, 228 : S466 - S469
1234