Brush electrodeposited CdS films on low temperature substrates

被引:2
|
作者
Murali, K. R. [1 ]
Kumaresan, S.
Prince, J. Joseph
机构
[1] Cent Electrochem Res Inst, Electrochem Mat Sci Div, Karaikkudi 630006, Tamil Nadu, India
[2] Saranathan Coll Engn, Dept Phys, Tiruchirappalli, India
[3] Bharathidasan Sch Engn, Dept Phys, Tiruchirappalli, India
关键词
CdS; II-VI; thin films; brush plating;
D O I
10.1016/j.matlet.2006.10.026
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Cadmium sulphide films were deposited by the brush plating technique on titanium and conducting glass substrates using a current density of 80 mA cm(-2). X-ray diffraction studies indicated the polycrystalline nature of the films with hexagonal structure. As the deposition temperature decreased, the peaks were broad indicating the formation of nanocrystallites. Optical absorption measurements yielded band gap values in the range of 2.39-3.10 eV as the deposition temperature decreases. XPS studies confirmed the formation of CdS. Atomic force microscope studies indicated the roughness of the films decreases with the decrease of deposition temperature. The as deposited films were photoactive. (C) 2006 Elsevier B.V All rights reserved.
引用
收藏
页码:2613 / 2615
页数:3
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