Monte Carlo study of anisotropic hole velocity overshoot in sub-0.1 μm GaAs devices for complementary circuit applications

被引:0
作者
Tagawa, Y [1 ]
Awano, Y [1 ]
Yokoyama, N [1 ]
机构
[1] Fujitsu Labs Ltd, Atsugi, Kanagawa 24301, Japan
来源
IEEE/CORNELL CONFERENCE ON ADVANCED CONCEPTS IN HIGH SPEED SEMICONDUCTOR DEVICES AND CIRCUITS, PROCEEDINGS | 1997年
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In order to evaluate tile high-speed and low-power performance of sub-0.1 mu m-sized GaAs devices used for complementary circuits, we studied full-band Monte! Carlo simulations of high field hole transport in bulk GaAs and one-dimensional p-i-p diodes. We found that the peak hole velocity under an electric field of 100 kV/cm reaches 2.2 x 10(7) cm/sec at room temperature, which is about three times higher than the steady-state drift, velocity. We also simulated anisotropic hole velocity overshoot effects anti demonstrated that the peak velocity with an electric field applied along the [100] direction is about 30% higher than in other. directions, Although the saturation velocities are almost, the same. In this paper, we discuss the hole velocity overshoot, affect on the characteristics of a nanometer-sized device, and present a similar anisotropic dependence, on the current drivability of 0.05 mu m p-i-p diodes.
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页码:297 / 303
页数:7
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