The surface potential of insulating thin films negatively charged by a low-energy focused electron beam

被引:38
|
作者
Li, Wei-Qin [1 ]
Zhang, Hai-Bo [1 ]
机构
[1] Xi An Jiao Tong Univ, Key Lab Phys Elect & Devices, Minist Educ, Dept Elect Sci & Technol, Xian 710049, Peoples R China
基金
中国国家自然科学基金;
关键词
Insulating thin films; Electron beam irradiation; Negative charging; Surface potential; Numerical simulation; MONTE-CARLO-SIMULATION; CONTRAST MECHANISM; RESIST; MICROSCOPE; EMISSION;
D O I
10.1016/j.micron.2010.02.010
中图分类号
TH742 [显微镜];
学科分类号
摘要
We report on the surface potential characteristics in the equilibrium state of the grounded insulating thin films of several 100 nm thickness negatively charged by a low-energy (<5 keV) focused electron beam, which have been simulated with a newly developed two-dimensional self-consistent model incorporating electron scattering, charge transport and charge trapping. The obtained space charge is positive and negative within and outside the region, respectively, where the electron and hole densities are greater than the trap density. Thus, the surface potential is relatively high around the center, then it decreases to a maximum negative value and finally tends to zero along the radial direction. The position of the maximum value is far beyond the range of e-beam irradiation as a consequence of electron scattering and charge transport. Moreover, a positive electric field can be generated near the surface in both radial and axial directions. The surface potential at center exhibits a maximum negative value in the condition of the similar to 2 key energy non-penetrating e-beam in this work, which is supported by some existing experimental data in scanning electron microscopy. Furthermore, the surface potential decreases with the increase in beam current, trap density and film thickness, but with the decrease in electron mobility. (C) 2010 Elsevier Ltd. All rights reserved.
引用
收藏
页码:416 / 422
页数:7
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