AlGaN/GaN HEMTs on (001) Silicon Substrate With Power Density Performance of 2.9 W/mm at 10 GHz

被引:25
作者
Gerbedoen, Jean-Claude [1 ]
Soltani, Ali [1 ]
Joblot, Sylvain [2 ,3 ]
De Jaeger, Jean-Claude [1 ]
Gaquiere, Christophe [1 ]
Cordier, Yvon [2 ]
Semond, Fabrice [2 ]
机构
[1] CNRS, IEMN, UMR 8520, F-59652 Villeneuve Dascq, France
[2] CRHEA CNRS, F-06560 Valbonne, France
[3] STMicroelect, F-38926 Crolles, France
关键词
AlGaN/GaN; High Electron Mobility Transistor (HEMT); microwave power; (001) Si; ELECTRON-MOBILITY; SI(111);
D O I
10.1109/TED.2010.2048792
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
AlGaN/GaN High Electron Mobility Transistors (HEMT) on a (001)-oriented silicon (Si) substrate are fabricated. The device with a gate length of 300 nm and a total gate periphery of 300 mu m exhibits a maximum dc drain current density of 600 mA/mm at V-GS = 0 V with an extrinsic transconductance (gm) of about 200 mS/mm. An extrinsic current gain cutoff frequency (f(T)) of 37 GHz and a maximum oscillation frequency (f(max)) of 55 GHz are deduced from S-parameter measurements. At 10 GHz, an output power density of 2.9 W/mm associated to a power-added efficiency (PAE) of 20% and a linear gain of 7 dB are obtained at V-DS = 30 V and V-GS = -2 V. To our knowledge, these power results represent the highest output power density ever reported at this frequency on GaN HEMT grown on (001) Si substrate.
引用
收藏
页码:1497 / 1503
页数:7
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