Electric microfield distribution in two-component plasmas. Theory and simulations

被引:0
作者
Ortner, J
Valuev, I
Ebeling, W
机构
[1] Humboldt Univ, Inst Phys, D-10115 Berlin, Germany
[2] Moscow Inst Phys & Technol, Dept Mol & Chem Phys, Dolgoprudnyi 141700, Russia
关键词
two-component plasma; electric microfield; semiclassical molecular dynamics;
D O I
10.1002/1521-3986(200009)40:5/6<555::AID-CTPP555>3.0.CO;2-5
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The distribution of the electric microfield at a charged particle moving in a two-component plasma is calculated. The theoretical approximations are obtained via the parameter integration technique and using the screened pair approximation for the generalized radial distribution function. It is shown that the two-component plasma microfield distribution shows a larger probability of high microfield values than the corresponding distribution of the commonly used OCP model. The theory is checked by quasiclassical molecular-dynamics simulations. For the simulations a corrected Kelbg pseudopotential has been used.
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页码:555 / 568
页数:14
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