MD simulation of sputtering on surface index and surface roughness dependence

被引:3
作者
Muramoto, T.
Kenmotsu, T.
机构
[1] Okayama Univ Sci, Okayama 7000005, Japan
[2] Kibi Int Univ, Takahashi 7168508, Japan
关键词
sputtering; simulation; polycrystalline target; rough surface; many-body collision;
D O I
10.1016/j.nimb.2006.11.024
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Low-energy sputtering is studied through molecular dynamics (MD) and binary-collision approximation (BCA) simulations. First, MD simulations as a preliminary study are performed for 5 keV Ar impacts on a Cu target. When random numbers gave the direction of the target crystal axis for each impact, the total sputtering yield almost agreed with the experimental yield of a polycrystalline Cu target. Second, we performed MD and BCA simulations for self-sputtering of W with an incident energy of 100 eV and incident angles of 0 degrees-85 degrees. We found that the many-body collision results in high-yield sputtering at grazing incidence. The incident angle dependence of sputtering yields fade out for an MD result with a rough surface. (c) 2006 Published by Elsevier B.V.
引用
收藏
页码:214 / 218
页数:5
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