Calixarene resists for nano-lithography.

被引：0
|
作者：
Ohnishi, Y [1 ]
Wamme, N [1 ]
Fujita, J [1 ]
机构：
[1] NEC CORP LTD,FUNDAMENTAL RES LABS,TSUKUBA,IBARAKI 305,JAPAN
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1997年 / 214卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
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页码：278 / PMSE
页数：1
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