Inactivation effect of electron beam irradiation on fungal load of naturally contaminated maize seeds

被引:30
作者
Nemtanu, Monica R. [1 ]
Brasoveanu, Mirela [1 ]
Karaca, Guersel [2 ]
Erper, Ismail [3 ]
机构
[1] Natl Inst Lasers Plasma & Radiat Phys, Electron Accelerators Lab, 409 Atomistilor St,POB MG-36, RO-077125 Bucharest, Romania
[2] Suleyman Demirel Univ, Dept Plant Protect, Fac Agr, TR-32260 Isparta, Turkey
[3] Ondokuz Mayis Univ, Dept Plant Protect, Fac Agr, TR-55139 Samsun, Turkey
关键词
food safety; Gompertz model; irradiation; radiosensitivity; survival curve; GAMMA-IRRADIATION; ASPERGILLUS-FLAVUS; BORNE FUNGI; RADIATION; MICROORGANISMS; SURVIVAL; SAFETY; MYCOTOXINS; INFECTION; QUALITY;
D O I
10.1002/jsfa.6607
中图分类号
S [农业科学];
学科分类号
09 ;
摘要
BACKGROUND: This work focuses on the effect of accelerated electrons (0.1-6.2 kGy) on naturally attached fungi on maize seeds. The fungal viability and corresponding inactivation kinetics were determined. The inactivation and radiosensitivity of the most abundant species in the contaminant fungi detected on maize seeds (Aspergillus spp., Penicillium spp. and Fusarium spp.) are discussed. RESULTS: Fungal contamination of maize seeds decreased significantly with increasing irradiation dose. The survival curve of total fungi determined by the blotter test showed a sigmoidal pattern that can be attributed to the mixture of fungal subpopulations with different radiation sensitivities. This behaviour could be modelled well (R-2 = 0.995) with a modified Gompertz equation. The predicted values for shoulder length and inactivation rate were 0.63 +/- 0.10 kGy and 0.44 +/- 0.04 kGy(-1) respectively. The sensitivity of the most common fungi to electron beam treatment followed the order Penicillium spp. > Fusarium spp. > Aspergillus spp., with total inactivation at irradiation doses of 1.7, 2.5 and 4.8 kGy respectively. CONCLUSION: The effect of electron beam treatment against fungi on naturally contaminated maize seeds depended on irradiation dose, allowing the control of maize fungal load. (c) 2014 Society of Chemical Industry
引用
收藏
页码:2668 / 2673
页数:6
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