Photoelectron spectra enhanced by x-ray total reflection and diffraction from periodic multilayer

被引：22

作者：

Hayashi, K

Kawato, S

Horiuchi, T

Matsushige, K

Kitajima, Y

Takenaka, H

Kawai, J

机构：

[1] NATL LAB HIGH ENERGY PHYS, PHOTON FACTORY, TSUKUBA, IBARAKI 305, JAPAN

[2] NIPPON TELEGRAPH & TEL PUBL CORP, INTERDISCIPLINARY RES LABS, MUSASHINO, TOKYO 180, JAPAN

[3] KYOTO UNIV, DEPT MAT SCI & ENGN, SAKYO KU, KYOTO 60601, JAPAN

来源：

APPLIED PHYSICS LETTERS | 1996年 / 68卷 / 14期

关键词：

D O I：

10.1063/1.115626

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Photoelectron spectra from a periodic multilayer of (Mo/B4C)(30)/Si were measured by changing the x-ray glancing angle. The angular dependencies of the photoelectron intensities of 0 1s and Mo 3d revealed the atomic depth profiles of the Mo oxide overlayer, and the compositions of the MoO3 upper layer and MoO2 lower layer. Furthermore, we observed enhancement of photoelectron emission by means of x-ray standing waves generated near the multilayer surface during x-ray diffraction from the superlattice. (C) 1996 American Institute of Physics.

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页码：1921 / 1923

页数：3

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