The Growth of One-Dimensional Single-Crystalline AlN Nanostructures by HVPE and Their Field Emission Properties

被引:18
作者
Byeun, Yun-Ki [1 ]
Telle, Rainer [1 ]
Jung, Se-Hyuk [2 ]
Choi, Sung-Churl [2 ]
Hwang, Hak-In [3 ]
机构
[1] Rhein Westfal TH Aachen, Inst Gesteinshuettenkunde Mineral Engn, Chair Ceram & Refractory Mat, D-52064 Aachen, Germany
[2] Hanyang Univ, Div Mat Sci Engn, Seoul 133791, South Korea
[3] Korea Elect Technol Inst, Convergence & Component R&D Div, Gyeonggi 463816, South Korea
关键词
Aluminum nitride; Field emission; Halide vapor-phase epitaxy; VLS-VS mechanism; Arrays; ELECTRON-AFFINITY; SOLID GROWTH; NITRIDE; ARRAYS;
D O I
10.1002/cvde.200906801
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Single-crystalline AlN nanostructures, such as thin films, nanoneedles, nanocolumns, and nanowires, depending on the controlled gas-flow ratio, are synthesized by halide vapor-phase epitaxy (HVPE). In comparison with a typical vapor/liquid/solid (VLS) mechanism for the growth of nanowires, well-aligned AlN nanorod arrays with diameters below 20 mm are grown on a catalyst-free Si substrate though a vapor/solid (VS) mechanism. Their structural and optical properties are measured by X-ray diffraction (XRD), transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS), and photoluminescence (PL). In particular, AlN nanorods exhibit an excellent field emission property with a low turn-on field of 2.25 V mu m(-1). The field enhancement factor is estimated to be about 784 due to well-aligned, needle-shaped, AlN nanorods.
引用
收藏
页码:72 / 79
页数:8
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