3D-Graphene/Boron Nitride-stacking Material: a Fundamental van der Waals Heterostructure

被引:7
作者
Fu Peng [1 ]
Jia Ran [1 ,2 ]
Wang Jian [1 ]
Eglitis, Roberts, I [2 ]
Zhang Hongxing [1 ]
机构
[1] Jilin Univ, Inst Theoret Chem, Changchun 130021, Jilin, Peoples R China
[2] Univ Latvia, Inst Solid State Phys, 8 Kengaraga Str, LV-1067 Riga, Latvia
基金
中国国家自然科学基金;
关键词
van der Waals heterostructure; Graphene; h-BN; Density functional theory; Electronic property; APPROXIMATION; SEMICONDUCTOR; EXCHANGE; GRAPHENE; PHASE;
D O I
10.1007/s40242-018-8075-4
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The 3D periodic graphene/h-BN(G/BN) heterostuctures were studied. The stacking forms between the graphene and h-BN layers were discussed. The varieties of the geometric and electronic configurations at the interface between graphene and h-BN layers were also reported. The metal-semiconductor transform of the G/BN material can be achieved by adjusting the stacking form of the h-BN layers or changing the proportion of graphene layers in the unit cell. An electrostatic potential well was found at the interface. Due to the potential well and the only dispersion correlation at the interface, the dielectric constant epsilon(zz) in vertical direction was independent on the variety of the thickness or the proportion of the compositions in an unit cell.
引用
收藏
页码:434 / 439
页数:6
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