Comparison of various colloidal silica slurries and process parameters for fused silica finishing

被引：0

作者：

Campaignolle, S. ^{[1
]}

Maunier, C. ^{[1
]}

Neauport, J. ^{[1
]}

机构：

[1] Commissariat Energie Atom & Energies Alternat, Ctr Etud Sci & Tech Aquitaine, F-33116 Le Barp, France

来源：

OPTIFAB 2015 | 2015年 / 9633卷

关键词：

optical fabrication; fused silica; CMP; finishing; roughness; surface defects;

D O I：

10.1117/12.2195724

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We have selected three colloidal silica slurries and compared their ability for fused silica finishing, by varying the load and slurry concentration. We found that the process parameters can affect differently the finishing efficiency, roughness and surface defects density, depending on the slurry considered.

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页数：5

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