A new approach for preparing effective inhibition film on copper based on self-assembled process

被引：0

作者：

Wang, CT

Chen, SH ^{[1
]}

机构：

[1] Shandong Univ, Dept Chem, Jinan 250100, Peoples R China

[2] State Key Lab Corros & Protect, Shenyang 110015, Peoples R China

来源：

CHINESE CHEMICAL LETTERS | 2003年 / 14卷 / 03期

关键词：

self-assembly; phenylthiourea (PT); 1-dodecanethiol (DT); AC voltage;

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A new method for preparing effective inhibition film on copper has been developed. Phenylthiourea (PT) was first absorbed to copper surface to form a monolayer. 1-Dodecanethiol (DT) was then assembled on the surface for modification. Finally, AC voltage was loaded on copper covered the mixed film to improve it further. After these processes, an effective inhibition film was gained because of its high charge transfer resistance and low corrosion current density shown in electrochemical impedance spectra and polarization. The inhibition efficiency was more than 97%.

引用

页码：308 / 311

页数：4