Prospects of extreme ultraviolet radiation sources based on microwave discharge for high-resolution lithography

被引：7

作者：

Abramov, I. S. ^{[1
]}

Gospodchikov, E. D. ^{[1
]}

Shalashov, A. G. ^{[1
]}

机构：

[1] Russian Acad Sci, Inst Appl Phys, Ulyanova Str 46, Nizhnii Novgorod 603950, Russia

来源：

PHYSICS OF PLASMAS | 2017年 / 24卷 / 07期

基金：

俄罗斯科学基金会;

关键词：

PLASMA; CONFINEMENT; ABSORPTION; IONS;

D O I：

10.1063/1.4993596

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

In this paper, inspired by the success of recent experiments, we discuss a new possible type of sources of extreme ultraviolet radiation for the semiconductor industry, based on the radiating plasma with multiply charged ions supported in a mirror magnetic trap by high-power microwaves. We propose a simple theory that describes the main features of such source, perform modeling for a wide range of plasma parameters and magnetic configurations, compare the results to the existing experimental data, and study the prospects of the new scheme in present technological circumstances. Published by AIP Publishing.

引用

页数：8

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