Comparison of stabilizing treatments on porous silicon for sensor applications

被引：40
作者：
Björkqvist, M [1 ]
Salonen, J
Laine, E
Niinistö, L
机构：
[1] Turku Univ, Dept Phys, FIN-20014 Turku, Finland
[2] Helsinki Univ Technol, Inorgan & Analyt Chem Lab, FIN-02015 Espoo, Finland
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 2003年 / 197卷 / 02期
关键词：
D O I：
10.1002/pssa.200306528
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The stabilities of porous silicon samples after thermal oxidation, thermal carbonization, thermal nitridation and dodecene-treatment have been compared. The stability of these samples in different temperatures and RH-atmospheres was examined by measuring the weight increase as a function of time. Also, the reactivity of the stabilized porous silicon samples in ethanol and KOH-solution at 25 degreesC was measured using an isothermal microcalorimeter. Other important properties of stabilized porous silicon samples for sensing applications, such as a specific surface area and a humidity adsorption behavior have also been compared.
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页码：374 / 377
页数：4
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