We here demonstrate a new route for deposition of phosphorous based materials by atomic layer deposition (ALD) using the phosphites Me3PO3 or Et3PO3 as precursors. These contain phosphorous in the oxidation state (III) and are open for deposition of reduced phases by ALD. We have investigated their applicability for the synthesis of LiPO and AlPO materials and characterized their growth by means of in situ quartz crystal microbalance. Phosphites are good alternatives to the established phosphate-based synthesis routes as they have high vapor pressure and are compatible with water as a coreactant during deposition. The deposited materials have been characterized using XPS, x-ray fluorescence, and ion beam analysis for composition analysis, spectroscopic ellipsometry for thickness, and FTIR for local structure.
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Korea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South Korea
Sungkyunkwan Univ, Dept Chem, 2066 Seobu Ro, Suwon 16419, Gyeonggi Do, South Korea
Sungkyunkwan Univ, Dept Energy Sci, 2066 Seobu Ro, Suwon 16419, Gyeonggi Do, South KoreaKorea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South Korea
Han, Seong Ho
Agbenyeke, Raphael Edem
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Korea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South Korea
Univ Sci & Technol, Dept Adv Mat & Chem Engn, 217 Gajeong Ro, Daejeon 34113, South KoreaKorea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South Korea
Agbenyeke, Raphael Edem
Lee, Ga Yeon
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Korea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South Korea
Sungkyunkwan Univ, Dept Chem, 2066 Seobu Ro, Suwon 16419, Gyeonggi Do, South Korea
Sungkyunkwan Univ, Dept Energy Sci, 2066 Seobu Ro, Suwon 16419, Gyeonggi Do, South KoreaKorea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South Korea
Lee, Ga Yeon
Park, Bo Keun
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Korea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South Korea
Univ Sci & Technol, Dept Adv Mat & Chem Engn, 217 Gajeong Ro, Daejeon 34113, South KoreaKorea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South Korea
Park, Bo Keun
Kim, Chang Gyoun
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Korea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South Korea
Univ Sci & Technol, Dept Adv Mat & Chem Engn, 217 Gajeong Ro, Daejeon 34113, South KoreaKorea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South Korea
Kim, Chang Gyoun
Lee, Young Kuk
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Korea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South Korea
Univ Sci & Technol, Dept Adv Mat & Chem Engn, 217 Gajeong Ro, Daejeon 34113, South KoreaKorea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South Korea
Lee, Young Kuk
Son, Seung Uk
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Sungkyunkwan Univ, Dept Chem, 2066 Seobu Ro, Suwon 16419, Gyeonggi Do, South Korea
Sungkyunkwan Univ, Dept Energy Sci, 2066 Seobu Ro, Suwon 16419, Gyeonggi Do, South KoreaKorea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South Korea
Son, Seung Uk
Chung, Taek-Mo
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Korea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South Korea
Univ Sci & Technol, Dept Adv Mat & Chem Engn, 217 Gajeong Ro, Daejeon 34113, South KoreaKorea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South Korea
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Luxembourg Inst Sci & Technol, Mat Res & Technol Dept, Rue Brill, L-4422 Belvaux, LuxembourgLuxembourg Inst Sci & Technol, Mat Res & Technol Dept, Rue Brill, L-4422 Belvaux, Luxembourg
Prasadam, V. P.
Dey, B.
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Luxembourg Inst Sci & Technol, Mat Res & Technol Dept, Rue Brill, L-4422 Belvaux, LuxembourgLuxembourg Inst Sci & Technol, Mat Res & Technol Dept, Rue Brill, L-4422 Belvaux, Luxembourg
Dey, B.
Bulou, S.
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Luxembourg Inst Sci & Technol, Mat Res & Technol Dept, Rue Brill, L-4422 Belvaux, LuxembourgLuxembourg Inst Sci & Technol, Mat Res & Technol Dept, Rue Brill, L-4422 Belvaux, Luxembourg
Bulou, S.
Schenk, T.
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Luxembourg Inst Sci & Technol, Mat Res & Technol Dept, Rue Brill, L-4422 Belvaux, LuxembourgLuxembourg Inst Sci & Technol, Mat Res & Technol Dept, Rue Brill, L-4422 Belvaux, Luxembourg
Schenk, T.
Bahlawane, N.
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Luxembourg Inst Sci & Technol, Mat Res & Technol Dept, Rue Brill, L-4422 Belvaux, LuxembourgLuxembourg Inst Sci & Technol, Mat Res & Technol Dept, Rue Brill, L-4422 Belvaux, Luxembourg
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US Army Res Lab, Sensors & Electron Devices Directorate, 2800 Powder Mill Rd, Adelphi, MD 20783 USAUS Army Res Lab, Sensors & Electron Devices Directorate, 2800 Powder Mill Rd, Adelphi, MD 20783 USA
Strnad, Nicholas A.
Hanrahan, Brendan M.
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US Army Res Lab, Sensors & Electron Devices Directorate, 2800 Powder Mill Rd, Adelphi, MD 20783 USAUS Army Res Lab, Sensors & Electron Devices Directorate, 2800 Powder Mill Rd, Adelphi, MD 20783 USA
Hanrahan, Brendan M.
Potrepka, Daniel M.
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US Army Res Lab, Sensors & Electron Devices Directorate, 2800 Powder Mill Rd, Adelphi, MD 20783 USAUS Army Res Lab, Sensors & Electron Devices Directorate, 2800 Powder Mill Rd, Adelphi, MD 20783 USA
Potrepka, Daniel M.
Pulskamp, Jeffrey S.
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US Army Res Lab, Sensors & Electron Devices Directorate, 2800 Powder Mill Rd, Adelphi, MD 20783 USAUS Army Res Lab, Sensors & Electron Devices Directorate, 2800 Powder Mill Rd, Adelphi, MD 20783 USA
Pulskamp, Jeffrey S.
Phaneuf, Raymond J.
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Univ Maryland, Dept Mat Sci & Engn, College Pk, MD 20742 USAUS Army Res Lab, Sensors & Electron Devices Directorate, 2800 Powder Mill Rd, Adelphi, MD 20783 USA
Phaneuf, Raymond J.
Polcawich, Ronald G.
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US Army Res Lab, Sensors & Electron Devices Directorate, 2800 Powder Mill Rd, Adelphi, MD 20783 USAUS Army Res Lab, Sensors & Electron Devices Directorate, 2800 Powder Mill Rd, Adelphi, MD 20783 USA