Optimization of the sputtering process parameters of GZO films using the Grey Taguchi method

被引：28

作者：

Chen, Chien-Chih ^{[1
]}

Tsao, Chung-Chen ^{[2
]}

Lin, You-Chiuan ^{[1
]}

Hsu, Chun-Yao ^{[1
]}

机构：

[1] Lunghwa Univ Sci & Technol, Dept Mech Engn, Tao Yuan 33306, Taiwan

[2] Tahua Inst Technol, Dept Automat Engn, Hsinchu 30740, Taiwan

来源：

CERAMICS INTERNATIONAL | 2010年 / 36卷 / 03期

关键词：

Gallium-doped zinc oxide; Transparent conductive oxide; Polymeric substrates; Grey relational analysis; Post-annealing; OXIDE THIN-FILMS; DOPED ZNO FILMS; SUBSTRATE-TEMPERATURE; ELECTRICAL-PROPERTIES; ZINC; THICKNESS; DEPOSITION; PERFORMANCES; TRANSPARENT; RESISTIVITY;

D O I：

10.1016/j.ceramint.2009.11.019

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

This paper examines the optimization of the process parameters of GZO films deposited on polyethylene terephthalate substrates by R.F. magnetron sputtering using the Taguchi method, aiming to obtain highly transparent and conductive films. The influences of the various sputtering factors (R.F. power, sputtering pressure, deposition time, substrate temperature and post-annealing temperature) on electrical resistivity and structural, morphological and optical transmittance of GZO films are analyzed. The electrical resistivity and the optical transmittance of GZO films were improved by post-annealing the substrate during the deposition process. Experimental results indicate the optimal process parameters in GZO films deposited on polyethylene terephthalate substrates can be determined effectively. The electrical resistivity of GZO films is decreased from 1.194 x 10(-3) Omega cm to 8.627 x 10(-4) Omega cm and the optical transmittance is increased from 86.148% to 90%, leading to multiple performance characteristics in deposition qualities through the Grey Taguchi method. (C) 2009 Elsevier Ltd and Techna Group S.r.l. All rights reserved.

引用

页码：979 / 988

页数：10

共 29 条

[1] Influence of the deposition pressure on the properties of transparent and conductive ZnO:Ga thin-film produced by r.f. sputtering at room temperature
Assunçao, V
Fortunato, E
Marques, A
Aguas, H
Ferreira, I
Costa, MEV
Martins, R
[J]. THIN SOLID FILMS, 2003, 427 (1-2) : 401 - 405
[2] Low-temperature deposition of ZnO thin films on PET and glass substrates by DC-sputtering technique
Banerjee, AN
Ghosh, CK
Chattopadhyay, KK
Minoura, H
Sarkar, AK
Akiba, A
Kamiya, A
Endo, T
[J]. THIN SOLID FILMS, 2006, 496 (01) : 112 - 116
[3] Production and characterization of zinc oxide thin films for room temperature ozone sensing
Bender, M
Gagaoudakis, E
Douloufakis, E
Natsakou, E
Katsarakis, N
Cimalla, V
Kiriakidis, G
Fortunato, E
Nunes, P
Marques, A
Martins, R
[J]. THIN SOLID FILMS, 2002, 418 (01) : 45 - 50
[4] Multi-criteria material selections and end-of-life product strategy: Grey relational analysis approach
Chan, Joseph W. K.
Tong, Thomas K. L.
[J]. MATERIALS & DESIGN, 2007, 28 (05) : 1539 - 1546
[5] Electrical and optical studies of ZnO:Ga thin films fabricated via the sol-gel technique
Cheong, KY
Muti, N
Ramanan, SR
[J]. THIN SOLID FILMS, 2002, 410 (1-2) : 142 - 146
[6] Optimization of the WEDM process of particle-reinforced material with multiple performance characteristics using grey relational analysis
Chiang, Ko-Ta
Chang, Fu-Ping
[J]. JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, 2006, 180 (1-3) : 96 - 101
[7] Cullity B., 1976, Elements of X-ray Diffraction, V2nd
[8] Deng Julong, 1989, Journal of Grey Systems, V1, P1
[9] Influence of substrate temperature on surface structure and electrical resistivity of the evaporated tin sulphide films
Devika, M.
Reddy, N. Koteeswara
Ramesh, K.
Ganesan, V.
Gopal, E. S. R.
Reddy, K. T. Ramakrishna
[J]. APPLIED SURFACE SCIENCE, 2006, 253 (03) : 1673 - 1676
[10] Resistivity of polycrystalline zinc oxide films: current status and physical limit
Ellmer, K
[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2001, 34 (21) : 3097 - 3108

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