Warm electrons are responsible for helicon plasma production

被引：17
作者：
Sahu, B. B. [1 ]
Ganguli, A. [2 ]
Tarey, R. D. [3 ]
机构：
[1] Dronacharya Coll Engn, Dept Appl Sci & Humanities, Gurgaon 123506, India
[2] Indian Inst Technol, Ctr Energy Studies, New Delhi 110016, India
[3] Indian Inst Technol, Dept Phys, New Delhi 110016, India
来源：
PLASMA SOURCES SCIENCE & TECHNOLOGY | 2014年 / 23卷 / 06期
关键词：
plasma sources; helicon wave; RF plasmas; power absorption; warm electron; mirror machine; double layer; POTENTIAL MEASUREMENTS; WAVE EXCITATION; EMISSIVE PROBE; HOT-ELECTRONS; DISCHARGE; ABSORPTION; ANTENNA; IONIZATION; FREQUENCY; SHOCKS;
D O I：
10.1088/0963-0252/23/6/065050
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
The present work discusses an overview of RF power absorption in helicon plasmas. Analysis suggests that the warm electron population is accountable for the argon plasma ionization in helicon plasma. Along with the experiment, there is an observation of a potential structure, identified as a double layer. However, unlike the other helicon double layer, the present experiment shows that the double layer does not appear at the magnetic field diffusion region; it is present in the linear magnetic field region.
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页数：12
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