Electrodeposition of diamond-like carbon films on silicon substrates using N,N-dimethylformamid

Diamond-like carbon (DLC) films were synthesized by an electrodeposition technique on silicon (Si) substrates using liquid N,N-dimethylformamid (DMF). The electrodeposition was performed in the temperature range from 40 to 80degreesC and the applied voltage range from -1 kV to -5 kV. The structures of the films were characterized by Raman spectroscopy. The films with the electrical resistivity of about 10(10) Omega(.)cm can be deposited using the liquid DMF under the liquid temperature of 80degreesC and the applied voltage of -2 kV. Moreover, the current density has an important role in the deposition of the films.