Single-step photopatterning of diffraction gratings in highly photosensitive hybrid sol-gel films

被引:24
|
作者
Kang, DJ [1 ]
Park, JU
Bae, BS
Nishii, J
Kintaka, K
机构
[1] Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, LOMC, Taejon 305701, South Korea
[2] Natl Inst Adv Ind Sci & Technol, Osaka 5638577, Japan
来源
OPTICS EXPRESS | 2003年 / 11卷 / 10期
关键词
D O I
10.1364/OE.11.001144
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Inorganic-organic hybrid materials prepared by a sol-gel process showed a large photoinduced negative refractive-index change (2x10(-2)) and a volume change. Diffraction gratings were made directly by irradiation with a KrF excimer laser (248 nm) through a phase mask without any etching process. The dependence of diffraction efficiency on irradiation conditions was investigated. The maximum diffraction efficiency, measured by the Littrow configuration with a He-Ne laser (633 nm), was 3.4% in reflection mode. (C) 2003 Optical Society of America.
引用
收藏
页码:1144 / 1148
页数:5
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