35-nm zigzag T-gate In0.52Al0.48As/In0.53Ga0.47As metamorphic GaAsHEMTs with an ultrahigh fmax of 520 GHz

被引:18
作者
Lee, Kang-Sung [1 ]
Kim, Young-Su
Hong, Yun-Ki
Jeong, Yoon-Ha
机构
[1] Pohang Univ Sci & Technol, Dept Elect & Elect Engn, Pohang 790784, South Korea
[2] Natl Ctr Nanomat Technol, Pohang 790784, South Korea
关键词
high-electron mobility transistor (HEMT); metamorphic; metamorphic high electron mobility transistor (mHEMT); nanometer scale T-gate; zigzag T-gate;
D O I
10.1109/LED.2007.901579
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Metamorphic GaAs high electron mobility transistors (mHEMTs) with the highest-f(max) reported to date are presented here. The 35-nm zigzag T-gate In0.52Al0.48As/ In0.53Ga0.47As metamorphic GaAs HEMTs show f(max) of 520 GHz, f(T) of 440 GHz, and maximum transconductance (g(m)) of 1100 mS/mrn at a drain current of 333 mA/mm. The combinations of f(max) and f(T) are the highest data yet reported for mHEMTs. These devices are promising candidates for aggressively scaled sub-35-nm T-gate mHEMTs.
引用
收藏
页码:672 / 675
页数:4
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