机构:
Brookhaven Natl Lab, Natl Synchrotron Light Source, Upton, NY 11973 USABrookhaven Natl Lab, Natl Synchrotron Light Source, Upton, NY 11973 USA
Evans-Lutterodt, K
[1
]
Ablett, JM
论文数: 0引用数: 0
h-index: 0
机构:Brookhaven Natl Lab, Natl Synchrotron Light Source, Upton, NY 11973 USA
Ablett, JM
Stein, A
论文数: 0引用数: 0
h-index: 0
机构:Brookhaven Natl Lab, Natl Synchrotron Light Source, Upton, NY 11973 USA
Stein, A
Kao, CC
论文数: 0引用数: 0
h-index: 0
机构:Brookhaven Natl Lab, Natl Synchrotron Light Source, Upton, NY 11973 USA
Kao, CC
Tennant, DM
论文数: 0引用数: 0
h-index: 0
机构:Brookhaven Natl Lab, Natl Synchrotron Light Source, Upton, NY 11973 USA
Tennant, DM
Klemens, F
论文数: 0引用数: 0
h-index: 0
机构:Brookhaven Natl Lab, Natl Synchrotron Light Source, Upton, NY 11973 USA
Klemens, F
Taylor, A
论文数: 0引用数: 0
h-index: 0
机构:Brookhaven Natl Lab, Natl Synchrotron Light Source, Upton, NY 11973 USA
Taylor, A
Jacobsen, C
论文数: 0引用数: 0
h-index: 0
机构:Brookhaven Natl Lab, Natl Synchrotron Light Source, Upton, NY 11973 USA
Jacobsen, C
Gammel, PL
论文数: 0引用数: 0
h-index: 0
机构:Brookhaven Natl Lab, Natl Synchrotron Light Source, Upton, NY 11973 USA
Gammel, PL
Huggins, H
论文数: 0引用数: 0
h-index: 0
机构:Brookhaven Natl Lab, Natl Synchrotron Light Source, Upton, NY 11973 USA
Huggins, H
Ustin, S
论文数: 0引用数: 0
h-index: 0
机构:Brookhaven Natl Lab, Natl Synchrotron Light Source, Upton, NY 11973 USA
Ustin, S
Bogart, G
论文数: 0引用数: 0
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机构:Brookhaven Natl Lab, Natl Synchrotron Light Source, Upton, NY 11973 USA
Bogart, G
Ocola, L
论文数: 0引用数: 0
h-index: 0
机构:Brookhaven Natl Lab, Natl Synchrotron Light Source, Upton, NY 11973 USA
Ocola, L
机构:
[1] Brookhaven Natl Lab, Natl Synchrotron Light Source, Upton, NY 11973 USA
[2] New Jersey Nanotechnol Consortium, Murray Hill, NJ 07974 USA
[3] SUNY Stony Brook, Dept Phys & Astron, Stony Brook, NY 11794 USA
[4] Agere Syst, Allentown, PA 18109 USA
来源:
OPTICS EXPRESS
|
2003年
/
11卷
/
08期
关键词:
D O I:
10.1364/OE.11.000919
中图分类号:
O43 [光学];
学科分类号:
070207 ;
0803 ;
摘要:
Using micro-fabrication techniques, we have manufactured a single element kinoform lens in single-crystal silicon with an elliptical profile for 12.398 keV (1Angstrom) x-rays. By fabricating a lens that is optimized at fixed wavelengths, absorption in the lens material can be significantly reduced by removing 2pi phase-shifting regions. This permits short focal length devices to be fabricated with small radii of curvatures at the lens apex. This feature allows one to obtain a high demagnification of a finite synchrotron electron source size. The reduced absorption loss also enables optics with a larger aperture, and hence improved resolution for focussing and imaging applications. Our first trial of these lenses has resulted in a one micron line focus (fwhm) at the National Synchrotron Light Source X13B beamline. (C) 2003 Optical Society of America.