Plasma and antenna characteristics of a linearly extended inductively coupled plasma system using multi-polar magnetic field

被引:5
作者
Kim, Kyong Nam [1 ]
Lim, Jong Hyeuk [1 ]
Yeom, Geun Young [1 ]
机构
[1] Sungkyunkwan Univ, Dept Mat Engn, Suwon 440746, South Korea
关键词
ICP; large-area; display; magnetic confinement;
D O I
10.1016/j.tsf.2006.10.057
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A novel internal-type linear inductive antenna, referred to as a "double comb-type antenna", was used as a large-area plasma source with a substrate area of 880 mm x 660 mm. This study investigated the effect of a multi-polar magnetic field on plasma confinement. High density plasma in the order of 3.2 x 10(11) cm(-3), which is 50% higher than that obtained for a source without a magnetic field, with good plasma stability was obtained at a pressure of 15 mTorr Ar and an RF power of 5000 W. Plasma uniformity < 3% within the substrate area was also obtained. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:5193 / 5196
页数:4
相关论文
共 12 条
[1]  
CROWLEY JL, 1992, SOLID STATE TECHNOL, V35, P94
[2]   Novel high-density plasma tool for large area flat panel display etching [J].
Heinrich, F ;
Banziger, U ;
Jentzsch, A ;
Neumann, G ;
Huth, C .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (03) :2000-2004
[3]  
HOLLAND J, 1996, SID S DIGEST, V27, P526
[4]   Review of inductively coupled plasmas for plasma processing [J].
Hopwood, J. .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1992, 1 (02) :109-116
[5]   Inductively coupled plasma source with internal straight antenna [J].
Kanoh, M ;
Suzuki, K ;
Tonotani, J ;
Aoki, K ;
Yamage, M .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2001, 40 (9A) :5419-5423
[6]   Effects of the axial external magnetic field on the reduction of the dielectric window damage due to capacitive coupling in the inductively coupled plasma [J].
Kim, JH ;
Lee, HJ ;
Kim, YT ;
Whang, KW ;
Joo, JH .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1997, 15 (03) :564-567
[7]   Design of a magnetic-pole enhanced inductively coupled plasma source [J].
Meziani, T ;
Colpo, P ;
Rossi, F .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2001, 10 (02) :276-283
[8]   Glow discharge processing in the liquid crystal display industry [J].
Schmitt, J ;
Elyaakoubi, M ;
Sansonnens, L .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2002, 11 (3A) :A206-A210
[9]   Development of internal-antenna-driven large-area RF plasma sources using multiple low-inductance antenna units [J].
Setsuhara, Y ;
Shoji, T ;
Ebe, A ;
Baba, S ;
Yamamoto, N ;
Takahashi, K ;
Ono, K ;
Miyake, S .
SURFACE & COATINGS TECHNOLOGY, 2003, 174 :33-39
[10]  
TAKEI H, 1998, SID 98 DIGEST, P1102