Industrial perspective on focused electron beam-induced processes

被引：31
|
作者：
Bret, Tristan [1 ]
Hofmann, Thorsten [1 ]
Edinger, Klaus [1 ]
机构：
[1] Carl Zeiss SMS GmbH, Betriebsstatte Rossdorf, D-64380 Rossdorf, Germany
来源：
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2014年 / 117卷 / 04期
关键词：
INDUCED DEPOSITION; REPAIR; MASKS; LITHOGRAPHY; FABRICATION; SIO2;
D O I：
10.1007/s00339-014-8601-2
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
After a short overview of the historical developments of the technique of gas-assisted focused electron beam-induced processing (mostly deposition and etching), this paper deals with the applications of this technology to photolithographic mask repair. A commented list of results is shown on different mask types, for different types of defects, and at different node generations. The scope of this article is double: summarize the state of the art in a fast-paced highly specific industrial environment driven by "Moore's law" and feedback to academic researchers some technologically relevant directions for further investigations.
引用
收藏
页码：1607 / 1614
页数：8
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