Processing of Finely Dispersed Zirconium Silicate Powder in a High-Frequency Induction Plasmatron Jet

被引：4

作者：

Novikov, I. N. ^{[1
]}

Kruchinin, A. M. ^{[1
]}

机构：

[1] Tekhnokeramika Co, SIGNAL Device Plant, Verkhove 249035, Kaluga Oblast, Russia

来源：

TECHNICAL PHYSICS LETTERS | 2014年 / 40卷 / 10期

关键词：

Technical Physic Letter; Discharge Chamber; High Frequency Discharge; High Frequency Generator; High Frequency Plasma;

D O I：

10.1134/S1063785014100253

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The physical peculiarities and prospects of using high-frequency plasma discharge for processing of finely dispersed zirconium silicate powder are considered. A high-frequency induction plasmatron setup is described.

引用

页码：920 / 922

页数：3