ATR-FTIR and nanoindentation measurements of PMDA-ODA polyimide film under different curing temperature

被引:19
作者
Lee, Shih-Chin
Tai, Fong-Cheng [1 ]
Wei, Che-Hung
Yu, Jui-I
机构
[1] Natl Cheng Kung Univ, Dept Mat Sci & Engn, Tainan 701, Taiwan
[2] TATUNG Univ, Dept Engn Mech, Taipei 104, Taiwan
[3] Natl Sun Yat Sen Univ, Inst Sci Mat, Kaohsiung 804, Taiwan
关键词
curing temperature; ATR-FTIR (Attenuated total reflectance-Fourier transform infrared spectrometer); micro-hardness; nanoelastic modulus; nano-hardness;
D O I
10.2320/matertrans.MER2007045
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
ATR-FTIR apparatus is used to measure the curing rate of PMDA-ODA polyimide film in order to avoid sinusoidal interference fringe. From the corrected height method, the curing rate is found to have positive correlative trend with the curing temperature. It was shown that the curing rate under 300 degrees C is 92.1% than that under 400 degrees C for one hour. The curing degree related to the mechanical properties was further demonstrated by nanoindentation. The results show that the higher the curing rate the higher the nano-hardness and nano-modulus due to the thermal imidization of polyimide characteristic. The nano-hardness ratio of curing degree at 300 degrees C over curing degree at 400 degrees C is 0.89, while the nano-modulus of which is 0.95.
引用
收藏
页码:1554 / 1557
页数:4
相关论文
共 28 条
  • [21] Effect of thermal curing on molecular orientation in polyimide films having rodlike molecular skeleton formed on substrates
    Nomura, H
    Asano, M
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (11): : 5825 - 5830
  • [22] Nanoindentation studies on polymorphism of nylon 6
    Shen, L
    Phang, IY
    Liu, TX
    [J]. POLYMER TESTING, 2006, 25 (02) : 249 - 253
  • [23] Determination of the hardness and elastic modulus of low-k thin films and their barrier layer for microelectronic applications
    Shen, L
    Zeng, KY
    Wang, YH
    Narayanan, B
    Kumar, R
    [J]. MICROELECTRONIC ENGINEERING, 2003, 70 (01) : 115 - 124
  • [24] Fundamental insight on developing low dielectric constant polyimides
    Simpson, JO
    St Clair, AK
    [J]. THIN SOLID FILMS, 1997, 308 : 480 - 485
  • [25] Heat resistant polyimide films with low dielectric constant by vapor deposition polymerization
    Ukishima, S
    Iijima, M
    Sato, M
    Takahashi, Y
    Fukada, E
    [J]. THIN SOLID FILMS, 1997, 308 : 475 - 479
  • [26] Structure and properties of polyimide films during a far-infrared-induced imidization process
    Xu, YK
    Zhan, MS
    Wang, K
    [J]. JOURNAL OF POLYMER SCIENCE PART B-POLYMER PHYSICS, 2004, 42 (13) : 2490 - 2501
  • [27] Investigations on high temperature polyimide potentialities for silicon carbide power device passivation
    Zelmat, S
    Locatelli, ML
    Lebey, T
    Diaham, S
    [J]. MICROELECTRONIC ENGINEERING, 2006, 83 (01) : 51 - 54
  • [28] APPL NOTE DYNAMIC IN