Intrinsic magnetoresistance in metal films on ferromagnetic insulators

被引:55
作者
Grigoryan, Vahram L. [1 ,2 ]
Guo, Wei [1 ,2 ]
Bauer, Gerrit E. W. [3 ,4 ,5 ]
Xiao, Jiang [1 ,2 ]
机构
[1] Fudan Univ, Dept Phys, Shanghai 200433, Peoples R China
[2] Fudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China
[3] Delft Univ Technol, Kavli Inst NanoSci, NL-2628 CJ Delft, Netherlands
[4] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
[5] Tohoku Univ, WPI AIMR, Sendai, Miyagi 9808577, Japan
来源
PHYSICAL REVIEW B | 2014年 / 90卷 / 16期
基金
中国国家自然科学基金;
关键词
SPIN; LAYER; FIELD;
D O I
10.1103/PhysRevB.90.161412
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We predict a magnetoresistance induced by the interfacial Rashba spin-orbit coupling in normal metal/ferromagnetic insulator bilayers. It depends on the angle between current and magnetization directions as found for the "spin Hall magnetoresistance" mechanism, i.e., the combined action of spin Hall and inverse spin Hall effects. By the identical phenomenology it is not obvious whether the magnetoresistance reported by Nakayama et al. [Phys. Rev. Lett. 110, 206601 (2013)] is a bulk metal or interface effect. The interfacial Rashba-induced magnetoresistance may be distinguished from the bulk metal spin Hall magnetoresistance by its dependence on the metal film thickness.
引用
收藏
页数:4
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