Properties of AlNx thin films prepared by DC reactive magnetron sputtering

被引：0
|
作者：
Stafiniak, Andrzej [1 ]
Muszynska, Donata [1 ]
Szyszka, Adam [1 ]
Paszkiewicz, Bogdan [1 ]
Ptasinski, Konrad [1 ]
Patela, Sergiusz [1 ]
Paszkiewicz, Regina [1 ]
Tlaczala, Marek [1 ]
机构：
[1] Wroclaw Univ Technol, Fac Microsyst Elect & Photon, PL-50372 Wroclaw, Poland
来源：
OPTICA APPLICATA | 2009年 / 39卷 / 04期
关键词：
aluminum nitride (AlN); thin films; reactive magnetron sputtering; alternative dielectrics; DIELECTRIC-PROPERTIES;
D O I：
暂无
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
In this paper, the results of investigation of the influence of cathode current on optical and dielectric AlNx thin-film properties are presented. AlNx films were prepared by pulsed DC reactive magnetron sputtering of Al target on substrates at room temperature. For characterization of fabricated test structures C-V spectroscopy, ellipsometry measurement and atomic force microscopy (AFM) were used.
引用
收藏
页码：717 / 722
页数：6
相关论文
共 50 条
  • [41] Surface and electrical properties of NiCr thin films prepared by DC magnetron sputtering
    Jicheng Zhou
    Li Tian
    Jianwu Yan
    Journal of Wuhan University of Technology-Mater. Sci. Ed., 2008, 23 : 159 - 162
  • [42] Electrochromic properties of niobium oxide thin films prepared by DC magnetron sputtering
    Yoshimura, K
    Miki, T
    Tanemura, S
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1997, 144 (09) : 2982 - 2985
  • [43] Structural and optical properties of the SiCN thin films prepared by reactive magnetron sputtering
    Peng, Yinqiao
    Zhou, Jicheng
    Zhao, Baoxing
    Tan, Xiaochao
    Zhang, Zhichao
    APPLIED SURFACE SCIENCE, 2011, 257 (09) : 4010 - 4013
  • [44] Electrical and structural properties of zirconia thin films prepared by reactive magnetron sputtering
    Hembram, K. P. S. S.
    Dutta, Gargi
    Waghmare, Umesh V.
    Rao, G. Mohan
    PHYSICA B-CONDENSED MATTER, 2007, 399 (01) : 21 - 26
  • [45] Optical properties of ZnO thin films deposited by dc reactive magnetron sputtering
    Meng, Li-Jian
    Andritschky, M.
    dos Santos, M.P.
    Vacuum, 1993, 44 (02): : 105 - 109
  • [46] Microstructure and Mechanical Properties of TaN Thin Films Prepared by Reactive Magnetron Sputtering
    Zaman, Anna
    Meletis, Efstathios I.
    COATINGS, 2017, 7 (12):
  • [47] Optical properties of bismuth oxide thin films prepared by reactive magnetron sputtering
    Leontie, L.
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2006, 8 (03): : 1221 - 1224
  • [48] Structural properties of TiN thin films prepared by RF reactive magnetron sputtering
    Dhanaraj, R.
    Mohamed, S. B.
    Kamruddin, M.
    Kaviyarasu, K.
    Manojkumar, P. A.
    MATERIALS TODAY-PROCEEDINGS, 2021, 36 : 146 - 149
  • [49] Investigations on Physical Properties of Nanostructured Cr doped CdO Thin Films Prepared by DC Reactive Magnetron Sputtering
    Hymavathi, B.
    Kumar, B. Rajesh
    Rao, T. Subba
    MATERIALS TODAY-PROCEEDINGS, 2017, 4 (08) : 7867 - 7874
  • [50] Optical properties of CdIn2O4 thin films prepared by DC reactive magnetron sputtering
    Yang, F. F.
    Fang, L.
    Zhang, S. F.
    Liao, K. J.
    Liu, G. B.
    Dong, J. X.
    Li, L.
    Fu, G. Z.
    JOURNAL OF CRYSTAL GROWTH, 2006, 297 (02) : 411 - 418
12345