Growth of epitaxially oriented silicon carbide on silicon by laser ablation of carbon targets and the structure of the silicon-silicon carbide interface

被引:0
|
作者
Rimai, L
Ager, R
Hangas, J
Samman, A
机构
来源
SILICON CARBIDE AND RELATED MATERIALS 1995 | 1996年 / 142卷
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The film-substrate interface of epitaxial SiC films deposited on Si by laser ablation of C targets shows a characteristic microstructure of cavities in the substrate. This implies that the film growth involves transport of Si through the growing film and reaction with the carbon in the plume
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页码:205 / 208
页数:4
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