One-step fabrication of nanostructures by femtosecond laser for surface-enhanced Raman scattering

被引:66
|
作者
Lin, Cheng-Hsiang [1 ,2 ]
Jiang, Lan [3 ]
Chai, Yen-Hsin [4 ]
Xiao, Hai [5 ]
Chen, Shean-Jen [1 ]
Tsai, Hai-Lung [2 ]
机构
[1] Natl Cheng Kung Univ, Dept Engn Sci, Tainan 70101, Taiwan
[2] Missouri Univ Sci & Technol, Dept Mech & Aerosp Engn, Rolla, MO USA
[3] Beijing Inst Technol, Sch 3, Dept Mech & Automat Engn, Beijing 100081, Peoples R China
[4] Technol & Sci Inst No Taiwan, Dept Elect Engn, Taipei 112, Taiwan
[5] Missouri Univ Sci & Technol, Dept Elect & Comp Engn, Rolla, MO USA
来源
OPTICS EXPRESS | 2009年 / 17卷 / 24期
关键词
SILVER ELECTRODE; SILICON; PHOTOREDUCTION; GLASS; SERS; NANOPARTICLES; SPECTROSCOPY; MORPHOLOGY;
D O I
10.1364/OE.17.021581
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
This paper reports an efficient fabrication of nanostructures on silicon substrates for surface-enhanced Raman scattering (SERS). Silicon wafer substrates in the aqueous solution of silver nitrate were machined by the femtosecond laser direct writing to achieve simultaneously in one-step the generation of grating-like nanostructures on the surface of the substrate and the formation of silver nanoparticles on the surface of the nanostructures via the laser-induced photoreduction effect. Parametric studies were conducted for the different concentrations of aqueous silver nitrate solutions and scanning speeds. The enhancement factor of the SERS is found to be higher than 10(9). The patterning technique provides an opportunity to incorporate the SERS capability in a functional microchip. (C) 2009 Optical Society of America
引用
收藏
页码:21581 / 21589
页数:9
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